发明名称 Installation for the chemical vapor infiltration of a refractory material other than carbon
摘要 PCT No. PCT/FR87/00036 Sec. 371 Date Dec. 7, 1987 Sec. 102(e) Date Dec. 7, 1987 PCT Filed Feb. 9, 1987 PCT Pub. No. WO87/04733 PCT Pub. Date Aug. 13, 1987.An armature in graphite constitutes a sealed structure oused with an inductor inside an enclosure, and defines a reaction chamber, connected outside the enclosure, with reactant gases supplying means; the enclosure is supplied with inert gas in order to keep a permanent flow of inert gas in the space surrounding the armature inside the enclosure, and the reactant products are removed from the reaction chamber and the inert gas from the enclosure by means of respective outlet pipes which join up outside the enclosure, so that substantially equal pressures are maintained in the enclosure, inside the outside the reaction chamber.
申请公布号 US4823734(A) 申请公布日期 1989.04.25
申请号 US19870112609 申请日期 1987.02.09
申请人 SOCIETE EUROPEENNE DE PROPULSION 发明人 CHRISTIN, FRANCOIS
分类号 C04B41/87;C04B41/45;C23C16/00;C23C16/32;C23C16/44;C23C16/455;(IPC1-7):C23C16/00 主分类号 C04B41/87
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