发明名称 |
Projection exposure apparatus |
摘要 |
An exposure apparatus particularly suitable usable for the manufacture of semiconductor microcircuit is disclosed. The apparatus includes a specific arrangement that allows accurate and precise detection of any change in the imaging magnification and/or the image surface position of a projection optical system included in the projection exposure apparatus. Thus, with the present invention, a pattern can be projected upon a workpiece with improved accuracy.
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申请公布号 |
US4825247(A) |
申请公布日期 |
1989.04.25 |
申请号 |
US19880155277 |
申请日期 |
1988.02.12 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
KEMI, RYUICHI;TAKAHASHI, KAZUO;FUJITA, ITARU |
分类号 |
G03F7/20;G03F7/207;(IPC1-7):G03B27/52 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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