| 摘要 |
PURPOSE:To enable observation dynamically by keeping the inside of a chamber, in which there is an electron gun, under an ultra-high vacuum, bringing the inside of a chamber, in which there is a sample, under a vacuum such as an arbitrary low vacuum and executing growth and etching. CONSTITUTION:An electron gun chamber 11 and a sample chamber 12 are partitioned by an orifice plate 15, electron rays from an electron gun 14 are passed through the orifice plate 15 and applied to a sample 18 in the sample chamber 12, and reflected electron rays 19 from the sample 18 are projected to a screen 17 in a screen-chamber adjacent to the sample chamber 12. The electron gun chamber 11 and the sample chamber 12 are respectively exhausted independently, and a plasma generator, etc., can be added to the sample chamber 12. The inside of the chamber, in which there is the electron gun 14, is kept under an ultra-high vacuum, the inside of the chamber, in which there is the sample 18, is brought to a vacuum such as an arbitrary low vacuum, and growth and etching can be executed, and an image equal to a normal RHEED on the screen 17 can be observed in the quite the same manner as an RHEED under the state. |
