| 摘要 |
A polishing solution composition for a color filter is provided to inhibit the interaction of a filter material such as a resin with a dye or a dispersant during polishing process, thereby preventing the deformation of the chemical properties of a pigment contained in a filter. A polishing solution composition for a color filter comprises 0.5-45 wt% of an abrasive selected from the group consisting of a carbon compound, diamond, a nitrogen compound and their mixture; a buffer solution used for controlling the pH; and an additive used for controlling the interface potential of the composition particle at a specific pH or less. Preferably the abrasive has a primary particle size of 10 nm to 1 micrometer; the carbon compound is selected from silicon carbide, boron carbide, titanium carbide, tungsten carbide, zirconium carbide and their mixture; and the nitrogen compound is selected from aluminum nitride, boron nitride, carbon nitride, titanium nitride, tantalum nitride and their mixture.
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