发明名称 |
MASK BLANK, AND PHOTOMASK |
摘要 |
A mask blank is provided to inhibit a tantalum-based semi-light transmitting film from being damaged by wet etching of a light shielding film, and to simplify the structure of a flat panel display device. A mask blank(20) for fabricating a flat panel display device comprises: a substrate(16); a semi-light transmitting film(17) formed on the substrate and comprising a tantalum-containing material; and a light shielding film(18) formed on the semi-light transmitting film and comprising a material containing chrome and nitrogen. The light shielding film comprising a material containing chrome and nitrogen has a multi-layer structure, wherein each layer contains chrome and nitrogen.
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申请公布号 |
KR20080089278(A) |
申请公布日期 |
2008.10.06 |
申请号 |
KR20080029212 |
申请日期 |
2008.03.28 |
申请人 |
HOYA CORPORATION;HOYA ELECTRONICS MALAYSIA SENDIRIAN BERHAD |
发明人 |
MITSUI MASARU;USHIDA MASAO |
分类号 |
G03F1/00;G03F1/50;G03F1/54 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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