| 摘要 |
PURPOSE:To obtain an electrophotographic sensitive body having improved adhesion of a charge injection inhibiting layer to an amorphous Si photoconductive layer and a superior charge injection inhibiting layer by regulating a relation between a concn. of B in the charge injection inhibiting layer and a film thickness thereof to a range maintaining a specified relation. CONSTITUTION:The title electrophotographic sensitive body is constituted of successively laminated layers of at least a charge injection inhibiting layer and an amorphous Si photoconductive layer on a base body. When the charge injection inhibiting layer is constituted of an amorphous Si contg. boron and the concn. of B in the charge injection inhibiting layer is denoted by c(ppm) and the film thickness of the charge injection inhibiting layer is denoted by d(mum), a relation between c and d is expressed by the inequality I. If the concn. of B is larger than the upper limit, the adhesion of the charge injection inhibiting layer to the amorphous Si photoconductive layer becomes inferior. If the B concn. is less than the lower limit, the charge injection inhibiting effect of the charge injection inhibiting layer decreases. By this constitution, an electrophotographic sensitive body satisfying requirements for the charge injection inhibiting effect and the adhesion of the charge injection inhibiting layer to the amorphous Si photoconductive layer is obtd. |
