发明名称 DETECTION OF POSITIONAL DIFFERENCE BETWEEN MASK AND WAFER
摘要 <p>PURPOSE:To eliminate the need for an optical system, and to simplify a device and reduce cost thereof by applying laser beams from the two directions in place of the scanning of laser beams by using two lenses and a vibrating mirror and the acquisition of a positional displacement signal, obtaining the difference of the intensity of each reflected diffracted light and acquiring the positional displacement signal. CONSTITUTION:Laser beams 7 applied to an LFZP 3 on a mask 1 at an incident angle theta are condensed onto a wafer 2 positioned where separate only by a gap (s) from the mask 1, and a spot is formed. Likewise, laser beams 8 applied to the LFZP 3 at an incident angle conjugate with laser beams 7 shape an imaging spot on the wafer 2. A distance between both imaging spots is represented by 2Ssintheta. An output from a detector 9 and an output from a detector 10 are amplified up to signal strength required by an amplifier. Accordingly, a servo system is constituted by using a normalized positional displacement signal acquired, thus preventing the change of servo gains due to the fluctuation of signal strength, then forming a stable servo system.</p>
申请公布号 JPH01106427(A) 申请公布日期 1989.04.24
申请号 JP19870264599 申请日期 1987.10.19
申请人 NEC CORP 发明人 TANAKA RYOJI;KONO HIDEKAZU;IWATA JOJI
分类号 G01B11/14;G03F7/20;G03F9/00;H01L21/027;H01L21/68 主分类号 G01B11/14
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