发明名称 Lithographic apparatus and device manufacturing method
摘要 The present invention relates to a clamping device configured to clamp an object on a support, comprising a first device configured to exert an attracting force on said object, and a second device configured to exert a rejecting force on said object, wherein said first device and second device are configured to simultaneously exert an attracting and a rejecting force on said object to shape said object to a desired shape before clamping of said object on said support. The invention further relates to a method for loading an object on a support, comprising the steps of shaping said object in a desired shape spaced from said support, wherein said shaping comprises subjecting said object simultaneously to an attracting force pulling said object towards said support and a rejecting force pushing said object away from said support, and clamping said object on said support.
申请公布号 US2008316461(A1) 申请公布日期 2008.12.25
申请号 US20070812818 申请日期 2007.06.21
申请人 ASML NETHERLANDS B.V. 发明人 COMPEN RENE THEODORUS PETRUS
分类号 G03B27/60 主分类号 G03B27/60
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