SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

摘要

A semiconductor manufacturing device and a manufacturing method thereof are provided to improve a processing quantity in a vertical semiconductor manufacturing device by instantaneously stepping up a gas by a gas storage part. A vertical semiconductor manufacturing device includes a reaction furnace(20) and a exhaust pipe(40). The exhaust pipe is contacted in a vacuum pump(26). A first supply pipe(41) supplies a first gas. A second supply pipe(38) supplies a second gas. A valve(22~25) controls a supply of the first supply pipe and the second supply pipe, and an exhaustion of the exhaust pipe. A gas storage part(21) is installed in the first supply pipe. A control part(29) controls the valve, and stores the first gas in the gas storage part. A wafer(W) is exposed in the first gas by supplying the first gas stored in the gas storage part to the furnace. The wafer is exposed in the second gas by supplying the second gas to the furnace through the second supply pipe while exhausting the furnace by the vacuum pump.