| 摘要 |
PURPOSE:To use a character having high visibility effectively by a method wherein a mirror reflection surface is coated with a light or beam sensitive substance, and exposed and developed by ultraviolet rays to a dot pattern having a specific shape, the sensitive substance is removed and a dot-pattern surface is left. CONSTITUTION:A substrate 1 has a cleaned polished flat surface to be marked, and must have mirror reflectivity to surrounding light. An oxide layer 15 is grown on the flat surface of the substrate 11 within a temperature range of approximately 900-1200 deg.C. A photosensitive layer 17 or a layer 17 sensitive to electron beams is applied onto the oxide layer 15. The sensitive layer 17 is composed normally of a photo-resist 29 or a resist. An arbitrary proper ultraviolet ray source (such as electron) such as beams 23 are used, and the photo- resist 29 is exposed selectively through a mask 19. A plurality of dots having size smaller than 50mum and pitches of 8-50mum are exposed to a dot pattern shape in the exposure of the photo-resist 29. The dots are developed so that soft sections in the photo-resist 29 are removed, and the dots can be visually observed finally. |
