发明名称 |
Demagnetization of magnetic media by C doping for HDD patterned media application |
摘要 |
Embodiments described herein provide methods and apparatus for treating a magnetic substrate having an imprinted, oxygen-reactive mask formed thereon by implanting ions into a magnetically active surface of the magnetic substrate through the imprinted oxygen-reactive mask, wherein the ions do not reduce the oxygen reactivity of the mask, and removing the mask by exposing the substrate to an oxygen-containing plasma. The mask may be amorphous carbon, through which carbon-containing ions are implanted into the magnetically active surface. The carbon-containing ions, which may also contain hydrogen, may be formed by activating a mixture of hydrocarbon gas and hydrogen. A ratio of the hydrogen and the hydrocarbon gas may be selected or adjusted to control the ion implantation. |
申请公布号 |
US9376746(B2) |
申请公布日期 |
2016.06.28 |
申请号 |
US201213715786 |
申请日期 |
2012.12.14 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
Hilkene Martin A.;Gouk Roman;Scotney-Castle Matthew D.;Porshnev Peter I. |
分类号 |
C23C14/48;C23C14/04 |
主分类号 |
C23C14/48 |
代理机构 |
Patterson & Sheridan, LLP |
代理人 |
Patterson & Sheridan, LLP |
主权项 |
1. A method of forming a patterned magnetic substrate, comprising:
forming a patterned oxygen-reactive mask comprising amorphous carbon on a magnetically active surface of a magnetic substrate, wherein the patterned oxygen-reactive mask defines exposed portions of the magnetically active surface; implanting carbon ions from a carbon containing plasma through the patterned oxygen-reactive mask into the exposed portions of the magnetically active surface of the magnetic substrate, wherein the carbon ions do not reduce the oxygen reactivity of the patterned oxygen-reactive mask; and removing the patterned oxygen-reactive mask by exposing the substrate to an oxygen-containing plasma. |
地址 |
Santa Clara CA US |