发明名称 Demagnetization of magnetic media by C doping for HDD patterned media application
摘要 Embodiments described herein provide methods and apparatus for treating a magnetic substrate having an imprinted, oxygen-reactive mask formed thereon by implanting ions into a magnetically active surface of the magnetic substrate through the imprinted oxygen-reactive mask, wherein the ions do not reduce the oxygen reactivity of the mask, and removing the mask by exposing the substrate to an oxygen-containing plasma. The mask may be amorphous carbon, through which carbon-containing ions are implanted into the magnetically active surface. The carbon-containing ions, which may also contain hydrogen, may be formed by activating a mixture of hydrocarbon gas and hydrogen. A ratio of the hydrogen and the hydrocarbon gas may be selected or adjusted to control the ion implantation.
申请公布号 US9376746(B2) 申请公布日期 2016.06.28
申请号 US201213715786 申请日期 2012.12.14
申请人 APPLIED MATERIALS, INC. 发明人 Hilkene Martin A.;Gouk Roman;Scotney-Castle Matthew D.;Porshnev Peter I.
分类号 C23C14/48;C23C14/04 主分类号 C23C14/48
代理机构 Patterson & Sheridan, LLP 代理人 Patterson & Sheridan, LLP
主权项 1. A method of forming a patterned magnetic substrate, comprising: forming a patterned oxygen-reactive mask comprising amorphous carbon on a magnetically active surface of a magnetic substrate, wherein the patterned oxygen-reactive mask defines exposed portions of the magnetically active surface; implanting carbon ions from a carbon containing plasma through the patterned oxygen-reactive mask into the exposed portions of the magnetically active surface of the magnetic substrate, wherein the carbon ions do not reduce the oxygen reactivity of the patterned oxygen-reactive mask; and removing the patterned oxygen-reactive mask by exposing the substrate to an oxygen-containing plasma.
地址 Santa Clara CA US