发明名称 CHARGED BEAM EXPOSURE SYSTEM
摘要 PURPOSE:To draw a large concentric circular shape while fixing a beam and to prevent drawing accuracy from deteriorating owing to beam deflection by providing a rotary stage which is driven to rotate on a linear positioning stage which is put in linear motion and projecting a converged charged beam on one point on the rotary stage vertically. CONSTITUTION:This device is equipped with the rotary driven stage 10 where a sample 1 is mounted, a charged beam convergence system which projects the generated charged beam on the surface of the rotary stage vertically and also converges it on the specific position, and the linear positioning stage 4 which moves the rotary stage 10 linearly at least in one direction in a plane crossing the projection direction of the charged beam at right angles. The irradiation position of the charged beam is fixed, the rotary stage 10 where the sample is mounted is moved by the linear positioning stage 4 to the specific position, and while the rotary stage 10 is rotated, a circular pattern is exposed. Consequently, the large circular pattern is exposed (including drawing) smoothly in a relatively short time.
申请公布号 JPH0196656(A) 申请公布日期 1989.04.14
申请号 JP19870253595 申请日期 1987.10.09
申请人 OMRON TATEISI ELECTRON CO 发明人 NAKAMURA KAZUTO
分类号 H01L21/027;G03F7/20;H01J37/20 主分类号 H01L21/027
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