发明名称 PHOTOSENSITIVE COMPOSITION
摘要 PURPOSE:To obtain a photosensitive layer with the high sensitivity and the excellent developing property by incorporating a specified high polymer compd. in the title composition. CONSTITUTION:The high polymer contains 1-50mol.% a structural unit com posed of an alcoholic hydroxyl group and/or a phenolic hydroxyl group, 5-40mol.% a structural unit shown by formula I, 5-40mol.% a unit composed of methyl acrylate, 25-60mol.% a structural unit shown by formula II and 2-30mol.% a structural unit of carboxyl group in a molecular structure, and is composed of a copolymer having a weight-average mol.wt. of 50,000-200,000. In formulas I and II, R<1> is hydrogen atom or alkyl group, R<2> is hydrogen atom or methyl group, etc., R<3> is 2-12C alkyl or alkyl substd. aryl group. Thus, the composition with the high sensitivity and the excellent developing property and plate wear is obtd.
申请公布号 JPH0194338(A) 申请公布日期 1989.04.13
申请号 JP19870252050 申请日期 1987.10.06
申请人 MITSUBISHI KASEI CORP;KONICA CORP 发明人 KATAHASHI ERIKO;FUMIYA SHINICHI;UEHARA MASABUMI;MATSUBARA SHINICHI
分类号 G03F7/016;G03F7/021;G03F7/033;G03F7/039 主分类号 G03F7/016
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