| 摘要 |
<p>PURPOSE:To prevent a disconnection by a method wherein, after a transparent conductive film has been formed on a whole face including the upper part of a resist left on a semiconductor film where a pattern has been formed, a conductive film on it is removed together with the resist and a source electrode and a drain electrode are formed on it. CONSTITUTION:When a pattern of a semiconductor film 3 is formed, a resist 21 formed on the semiconductor film 3 is left as it is; a conductive film 22 of one or more layers which include at least a transparent conductive film 14 to be used as a pixel electrode 8 and whose thickness is about the same as that of the semiconductor film 3 is generated. Then, the resist 21 is removed together with the conductive film 22 on the resist 21; patterns of a source electrode 5 and a drain electrode 4 are formed on a flat face including the surface of the semiconductor film 3 which has been obtained by removing the resist 21. By this setup, it is possible to prevent the source electrode and the drain electrode from being disconnected.</p> |
