发明名称 Substrate holder, support table for a lithographic apparatus, lithographic apparatus and device manufacturing method
摘要 A substrate table (WT) supports a substrate holder (WH) to which a substrate (W) is clamped for exposure. The substrate table (WT) has a plurality of e-pins (30) spaced apart from and distributed around the center of the substrate holder for receiving and lowering a substrate onto the substrate holder prior to exposure and raising a substrate off the substrate holder after exposure. Tip portions of the e-pins (30) and the corresponding apertures (24) in the substrate holder (WH) have a shape in plan including at least one re-entrant, e.g. a cross shape.
申请公布号 IL246289(D0) 申请公布日期 2016.07.31
申请号 IL20160246289 申请日期 2016.06.16
申请人 ASML NETHERLANDS B.V. 发明人
分类号 G03F 主分类号 G03F
代理机构 代理人
主权项
地址