| 摘要 |
An active inertial isolation system is disclosed generally for any inertial body, and also for bodies subject to structural resonance, and further particularly for a microlithography system (2) for processing semiconductor wafers (4) subject to a submicron design rule. One or more linear forcers (94, 76, 74, 94' 76', FIGS. 18 and 19) are provided for applying a force between the body or worktable (6) and a reaction mass RM (202, 204, 206, 210). One or more accelerometers (98, 78) sense acceleration of the body (6) and apply force against sensed acceleration regardless of the position or variation of position of the body (6) relative to the reaction mass RM. The reaction mass RM may be supported relative to the linear forcer, and/or be a part thereof or rigidly fixed thereto, or the reaction mass RM may be supported relative to a reference such as a sidewall or the floor.
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