| 摘要 |
PURPOSE:To accurately measure the flow velocity of plasma over a long period by projecting laser beams on the plasma flow so that the beams cross the flow at plural places, and calculating the flow velocity of plasma from the charging time of the laser beam and the distance between the beams. CONSTITUTION:The laser beam sources 7, 8, and 9 are provided in parallel with the plasma flow 6 generated between a sputtering target 3 and an anode 4 in a DC sputtering device, the laser beams are generated in the direction orthogonal to the plasma flow 6, and the beams are allowed to cross the plasma flow 6 at three places. The laser beams are received by photodetectors 10, 11, and 12. The flow velocity of the plasma 6 is calculated from the time spent for the laser beam to cross the plasma flow 6 in accordance with the increase and decrease in the quantity of the light received and the distance between the respective laser beams. By this method, the plasma flow velocity is accurately measured oven a long period without being significantly affected by the sputtering. |
