METHOD FOR PRODUCING PHOTOMASK, DRAWING DEVICE, INSPECTION METHOD FOR PHOTOMASK, INSPECTION DEVICE FOR PHOTOMASK AND METHOD FOR PRODUCING DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method for producing a photomask capable of enhancing the coordinate precision of a pattern formed on a transferred body.SOLUTION: There is provided a method for producing a photomask which comprises: a step of preparing pattern design data A; a step of obtaining transfer surface shape data C exhibiting a deformation quantity on a main surface of a photomask caused by holding of the photomask in an exposure device; a step of obtaining height distribution data E during drawing exhibiting a height distribution of a main surface of a photomask blank in a state where the photomask blank is mounted on a stage of a drawing device; a step of obtaining drawing difference data F from a difference between the height distribution data E during drawing and the transfer surface shape data C; a step of determining drawing coordinate shift amount data G by calculating a coordinate shift amount corresponding to the drawing difference data F; and a drawing step of drawing a pattern on the photomask blank using the drawing coordinate shift amount data G and the pattern design data A.SELECTED DRAWING: Figure 7