发明名称 APPARATUS FOR EVALUATING FLATNESS OF THIN FILM
摘要 PURPOSE:To obtain the flatness of a thin film quantitatively without cutting, by optically observing the thin film of a substrate in many aspects, collecting and recording the data of reflected light from each light receiving sensor for a short time and outputting the data as required. CONSTITUTION:Luminous flux from a light emitting source 12 in an observing part 10 is projected on a stage 11. The reflected light is received with light receiving sensors 13-15. The outputs from the light receiving sensors are controlled with a controller 21. The intensity of the reflected light which is detected for a short time of about 50ms is recorded in a recorder 23 as a digital quantity through a computer 22. The data are outputted to an output device 24 as required. The measures as standards of flatness are obtained in correspondence with the patterns of the intensity distribution of the reflected light of various samples or various thin films. The flatness of the thin film can be quantitatively evaluated and obtained without cutting based on these database.
申请公布号 JPS6491009(A) 申请公布日期 1989.04.10
申请号 JP19870247819 申请日期 1987.10.02
申请人 HITACHI LTD 发明人 TAKAHASHI SHIGERU;SUNAMI HIDEO;FUNAKOSHI KIYOHIKO;OKUDAIRA SADAYUKI;TAMURA MASAO;YOSHIHIRO NAOJI;TSUNEKAWA SUKEYOSHI;KAGA TORU
分类号 G01B11/30;G01N21/88;G01N21/93;G06T1/00;H01L21/66 主分类号 G01B11/30
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