METHOD FOR DEVELOPING POSITIVE PHOTORESIST LAYER

摘要

A process for developing a positive radiation-sensitive resist film coated on a suitable substrate comprises treating the exposed film with aq. alkali contg. a surfactant (about 0.001-1.0 wt.%) e.g. fluorocarbon or carboxylic acid salt; rinsing with water; and treatment with an aq. developer contg. surfactant (at least 0.0001%) at PH at least 9 to dissolve the exposed portion.