| 摘要 |
The cup like support of a vacuum vapor deposition apparatus for substrates to be coated comprises a plurality of pivotable support plates each with a plurality of openings for substrate holders. The substrate holders can have a frame partially embracing the substrate received in it in which the substrate sits acted on by a retaining spring and which is attached to the support plate freely tiltable on both sides about a tilting axle. Alternatively at least one of the substrate holders is tiltable and each of the remaining holders is nontiltable having a gripping arm attached at its inner end to a tension providing spring at the edge of an opening in the support plate which is covered by a pair of circular plates. Because of these features a nearly complete fit of the shape of the support to the ideal shape of a cup can be attained by the freely tiltable substrate holders which tilt from the support plate plane to a predetermined angle. Thus a more uniform coating on both sides of all the substrates is produced.
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