| 摘要 |
PURPOSE:To provide stationary stability and excellent redispersibility for a long time, by a method wherein, in a polishing agent for industrial use used especially for a high speed and precision polishing, a dispersant consisting of polystyrene sulfonic acid or salt thereof is blended. CONSTITUTION:Approximate 0.01-5wt.% preferably approximate 0.05-3wt.% polystyrene sulfonic acid or salt thereof, serving as a dispersant, is added in a suspension of a polishing agent, e.g., cerium oxide, zirconium oxide, diamond powder, alumina, and water. A molecular amount of 3,000-1,000,000, preferably 5,000-500,000, is used as polystyrene sulfonic acid or salt thereof, and sodium, calium, etc., are used as a counter ion in salt. This constitution enables provision of stationary stability in high concentration of a polishing agent suspension for a long time, and provision of excellent redispersability, improvement of polishing characteristics, e.g., improvement of a polishing speed, reduction of surface damage, and improvement of working efficiency. |
