| 摘要 |
PURPOSE:To make an analytic electron image out of a sample directly indicatable on a display by setting up an electron beam detector, relatively scannable to the sample, in the lower part of the sample, and indicating a signal of the electron beam detector on the display as making it correspond to a scanning position. CONSTITUTION:When a sample S is set on a sample stage 1 and an electron beam B is irradiated to it, the sample S receives an action of the electron beam B, emitting X-rays in accord with a surface structure, and it is detected by a detector 7, serving as data for surface property analysis. Simultaneously, the sample S analyzes the electron beam with a pattern dependent on the crystal structure. This analytic electron beam advances in the lower part of the sample stage 1 and it is incident into an electron beam detector 3. In this state, when a scanning mechanism 4 is operated and the electron beam detector 3 is moved to the sample S, such a signal that accords with intensity of the electron beam at scanning point is outputted from the electron beam detector 3, whereby it is inputted into a picture processing circuit 5 together with a position signal at the scanning point. With this constitution, a detection signal is indicated on a display 6 after being adjusted to a scanning position of the detector 3, thus such an image that is accorded with an electron beam analytic pattern of the sample S is displayed. |
