发明名称 Method for exactly adjusting bands (fringes, stripes) of an interference pattern parallel to an edge of a substrate
摘要 For the lines or grooves (furrows) of an optical grating on a substrate (Sub) to run exactly parallel to a predetermined edge (Kt) of the substrate (Sub), the bands (Str) of the interference pattern (IM) used for generating the grating have to be adjusted so as to be exactly parallel to the edge (Kt). The novel method makes it possible for the bands (Str) to be adjusted in a very precise manner parallel to the edge (Kt). An optical deflection grating (BG) with grating lines (GL) which are resolvable at least with an optical microscope and lie exactly parallel to the predetermined edge (Kt) is generated on the substrate (Sub), which deflection grating (BG) is irradiated with an auxillary beam (HS) which lies in the plane (E1) or parallel to the plane (E1) of the two beams (S1, S2) generating the interference pattern (IM). The substrate (Sub) is adjusted such that the beams (gS, P) deflected by the deflection grating (BG) lie in the plane (E1) of the mutually interfering beams (S1, S2) or parallel thereto. Application to the assembly of integrated-optical Bragg reflectors on waveguides. <IMAGE>
申请公布号 DE3731147(A1) 申请公布日期 1989.03.30
申请号 DE19873731147 申请日期 1987.09.16
申请人 SIEMENS AG 发明人 HEISE,GERHARD,DIPL.-PHYS.
分类号 G02B6/124 主分类号 G02B6/124
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