发明名称 A component for producing semi-conductor devices and process of producing it.
摘要 <p>A component for producing semiconductor devices such as a tube, a boat or the like, comprising a component body made of a silicon carbide material, a silica layer formed on a surface of the body and a CVD coating layer of silicon carbide formed on the silica layer. The silica layer has a thickness ranging between 0.1 and 5 microns. The CVD coating layer has a thickness ranging between 50 to 1000 microns.</p>
申请公布号 EP0308695(A2) 申请公布日期 1989.03.29
申请号 EP19880114166 申请日期 1988.08.31
申请人 TOSHIBA CERAMICS CO., LTD. 发明人 OHTO, TAKASHI C/O OGUNI PLANT OF TOSHIBA CERAMICS;TANAKA, TAKASHI C/O OGUNI PLANT TOSHIBA CERAMICS;SATOH, MAKOTO C/O OGUNI PLANT OF TOSHIBA CERAMICS
分类号 C04B41/89;C04B41/52;C23C16/44;C30B31/14;C30B35/00;H01L21/205;H01L21/22 主分类号 C04B41/89
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