| 摘要 |
PURPOSE:To prevent a photoresist or the like from bouncing from an inner wall of a cup and to facilitate sticking of a coating liquid to the surface of a substrate or the like, by composing a chuck for supporting the substrate so that it can rotate freely in the vertical direction centrally and besides by rotating a nozzle horizontally to go back and forth freely. CONSTITUTION:A vacuum pump 6 is operated to fix a substrate 7 on a chuck 2. Next a nozzle 4 is used to dip a photoresist for example on a substrate surface 7a on an upper side of the substrate 7, and the substrate is slowly rotated to make the photoresist expand over the whole surface of this substrate surface 7a. The nozzle 4 is housed into a side part of a cup 1, and then the chuck 2 for supporting the substrate is rotated in the vertical direction centrally together with a motor 3 or the like, so that a substrate side 7a of the substrate 7 is turned downwards. The substrate is rotated in this state at a high speed of 3000-5000rpm to blow away a needless photoresist, and a photoresist film 8 of a desired thickness can be obtained accordingly. |
