发明名称 AGENT FOR PEELING PHOTORESIST
摘要 PURPOSE:To enhance peeling power by incorporating dimethylsulfoxide and at least one of aminoalcohols, and water. CONSTITUTION:The resist peeling agent strong in the peeling power is obtained by incorporating dimethylsulfoxide, preferably, in an amount of >=30wt.%, and at least one of the aminoalcohols, preferably, in an amount of 1-50wt.%, and water, preferably, in an amount of 5-60wt.%, each on the basis of the total weight of the peeling agent, thus permitting the obtained peeling agent to have high peeling power, to exhibit superior washing power for ionic substances, by the presence of water, and to perfectly clean the surface of an inorganic base after finishing cleaning.
申请公布号 JPS6481950(A) 申请公布日期 1989.03.28
申请号 JP19870238963 申请日期 1987.09.25
申请人 ASAHI CHEM IND CO LTD 发明人 MATSUMOTO KATSUO;HAMADA KAZUYUKI
分类号 G03C11/00;G03F7/00;G03F7/42;H01L21/027 主分类号 G03C11/00
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