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发明名称
FORMATION OF DOPING SILICON THIN FILM
摘要
申请公布号
JPS6481314(A)
申请公布日期
1989.03.27
申请号
JP19870240089
申请日期
1987.09.24
申请人
NEC CORP
发明人
MATSUI SHINJI
分类号
H01L21/225;H01L21/205
主分类号
H01L21/225
代理机构
代理人
主权项
地址
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