| 摘要 |
PURPOSE:To cleanly remove a resist completely by heating only the surface of the resist on a substrate surface in an ashing process by the use of a flash lamp and the like together with cooling the substrate. CONSTITUTION:A device is composed of a vacuum vessel 21, a gas introducing inlet 22, an outlet 23 and electrodes 26, a print plate 28 is spread on the electrodes 26, and a resist-coated specimen 27 is put thereon. High frequency electric power is applied from high frequency electrodes 34 on the electrodes 26 cooled by a water cooling pipe 30, plasma is produced and gas such as oxygen is excited. A window 24 made of zinc sulfide is provided on the upper part of the vacuum vessel 21, and the surface of the specimen 27 is irradiated with infrared light and the like from a light source 25. The light source 25 is a flash lamp, lighted intermittently and a lighting cycle time can be regulated. Therefore, when only the surface of the resist is momentarily heated by infrared light and the like, the resist can be removed completely without leaving residue with cooling the substrate 27 in the reduction-to-ash process by oxygen plasma. |
