| 摘要 |
<p>PURPOSE:To reduce the production cost and the defect rate by incorporating display driving elements on an active matrix substrate while using a specified photo mask for photo process to pattern an insulating film and a connection film in prescribed positions. CONSTITUTION:A pattern 61 shared with a semiconductor thin film and the connection film and a window pattern 62 of the connection film are shifted from each other and are formed in a photo mask 60, and mask matching marks 63 and 64 are provided on the peripheral edge part. Picture element electrodes 10 and driving line electrodes 30 are patterned on the active matrix substrate, where display driving elements are incorporated, with a mask different from the mask 60, and a semiconductor thin film 3 is stuck to all of the surface. The mask 60 is used to perform patterning and an insulating film 5 is formed, and windows 6 are opened. The insulating film 5 is removed from the peripheral edge part of the substrate and remains to cover almost all of the surface of the substrate 5. The mask 60 is used to form a connection film 7. Thus, the production cost is reduced and the defect rate is reduced.</p> |
