发明名称 LASER BEAM CVD DEVICE
摘要 PURPOSE:To suppress the diffusion of a reactive gas by forming a discharge path enclosing the laser light introducing window and the reactive gas introducing port on the inside surface of the upper wall of a reaction chamber so that said discharge path is communicated with the reactive gas discharge port. CONSTITUTION:The glass window 7 is formed as the laser light introducing window in the central part of the upper wall 9a of the reaction chamber 9. The reactive gas is introduced into the reaction chamber 9 by the reactive gas introducing port 3 provided near the glass window 7. The reactive gas which is not used for formation of a thin film is sucked and removed from reactive gas discharge ports 2, 4. The reactive gas discharge port 4 is placed in the position symmetrical with the reactive gas introducing port 3 and the reactive gas discharge port 2 is communicated with the discharge port 2a in the form of enclosing the reactive gas introducing port 3, the discharge port 4 and the glass window 7. 30-40% of the discharged reactive gas diffuses to the peripheral space. This diffusion gas is sucked by the discharge path 2a and the reactive gas discharge port 2. The contamination of the other spaces in the reaction chamber 9 by the reactive gas is thereby prevented.
申请公布号 JPS6479374(A) 申请公布日期 1989.03.24
申请号 JP19870237864 申请日期 1987.09.22
申请人 NEC CORP 发明人 MURAKAMI SHINGO
分类号 B23K26/12;C23C16/44;C23C16/455;C23C16/48 主分类号 B23K26/12
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