| 摘要 |
PURPOSE:To obtain the good development property of the titled material by composing the titled material with the mother body part of the tabular particle of silver halide and a specified projecting part of the silver halide which is selectively formed only on the main pulse surface of said mother body. CONSTITUTION:The titled material comprises the projecting part of the silver halide which is selectively formed only on the main plane surface of said mother body. The halogen composition of said projecting part is different from that of the mother body of the tabular particle of the silver halide. Namely, the titled material contains the silver halide particle in which the diameter of the mean projected area of said projecting part is <=0.15mum, and the numbers of the projecting part presented on the main plane surface of said mother body is 20-10,000 numbers/mum<2>. A chemically sensitized point is positioned on the position where the projecting part does not exist. Thus, the good development property of the titled material can be obtd. |
