发明名称 |
Method of forming a sputtering target for use in producing a magneto-optic recording medium. |
摘要 |
<p>A sputtering target for use in producing a magneto-optic recording medium of a rare earth-transition metal alloy by sputtering, the sputtering target being made of a cast alloy having an alloy phase (1) of one or more rare earth metals and of one or more transition metals, characterised in that the cast alloy also comprises a phase (3) of a rare earth metal or of an alloy of a plurality of rare earth metals, and a phase (2) of a transition metal or of an alloy of a plurality of transition metals.</p> |
申请公布号 |
EP0308201(A1) |
申请公布日期 |
1989.03.22 |
申请号 |
EP19880308503 |
申请日期 |
1988.09.14 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
AOYAMA, AKIRA;SHIMOKAWATO, SATOSHI;YAMAGISHI, TOSHIHIKO |
分类号 |
C23C14/34;G11B5/851;G11B11/105;H01F41/18;(IPC1-7):C23C14/34;C22C33/00;C22C38/00;G11B7/24 |
主分类号 |
C23C14/34 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|