发明名称 Method of forming a sputtering target for use in producing a magneto-optic recording medium.
摘要 <p>A sputtering target for use in producing a magneto-optic recording medium of a rare earth-transition metal alloy by sputtering, the sputtering target being made of a cast alloy having an alloy phase (1) of one or more rare earth metals and of one or more transition metals, characterised in that the cast alloy also comprises a phase (3) of a rare earth metal or of an alloy of a plurality of rare earth metals, and a phase (2) of a transition metal or of an alloy of a plurality of transition metals.</p>
申请公布号 EP0308201(A1) 申请公布日期 1989.03.22
申请号 EP19880308503 申请日期 1988.09.14
申请人 SEIKO EPSON CORPORATION 发明人 AOYAMA, AKIRA;SHIMOKAWATO, SATOSHI;YAMAGISHI, TOSHIHIKO
分类号 C23C14/34;G11B5/851;G11B11/105;H01F41/18;(IPC1-7):C23C14/34;C22C33/00;C22C38/00;G11B7/24 主分类号 C23C14/34
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