发明名称 TARGET FOR SPUTTERING
摘要 PURPOSE:To produce a target for sputtering which is capable of forming uniform films having no component distribution by forming the cast alloy target of the simple substance layer of rare earth metals, the simple substance layer of transition metals and the alloy phase of rare earth and transition metals. CONSTITUTION:NdDy powder consisting of about 23at.% Nd and about 77at.% Dy and FeCo powder consisting of about 80.5at.% Fe and about 19.5at.% Co are prepd. These powders are charged into a crucible and are completely melted to form the alloy consisting of about 6.5at.% Nd, about 21.5at.% Dy, about 58.0at.% Fe, and about 14.0at.% Co. The molten alloy is maintained at about 1,300 deg.C. The respective powders of said NdDy and FeCo are then charged into this molten alloy so as to attain the ratios expressed by the formulas I-III, the respective powders have high m.p. and are, therefore, not dissolved and the molten metal in which the three phases co-exist is obtd. The target is obtd. by casting this molten metal. The target for sputtering which forms uniform magneto-optical recording layers without having the compsn. distributions is thereby obtd.
申请公布号 JPS6475672(A) 申请公布日期 1989.03.22
申请号 JP19870232772 申请日期 1987.09.17
申请人 SEIKO EPSON CORP 发明人 AOYAMA AKIRA
分类号 C23C14/34;G11B5/851;G11B11/105;H01F41/18 主分类号 C23C14/34
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