| 摘要 |
<p>Methods of avoiding or mitigating effects of eddy currents due to leakage flux of a magnetic lens (2) in a charged particle beam exposure system, and systems (apparatuses) which can expose a substrate to a charged particle beam (8) while a stage (1) carrying the substrate is moving. A step and repeat exposure system can be operated while the stage (1) is moving, so that the throughput of the system is improved. Deviation of the charged particle beam (8) caused by eddy currents is proportional to the velocity of the stage (Vx, Vy). Proportional constants (A, B, C, D) of the beam deviation to the velocity of the stage (1) are therefore measured in advance, and a correction term which is a product of the speed of the stage and the proportional constant is fed back to a deflector (33) of the charged particle beam (8). The proportional constants, for example, are obtained from the shift of an image of a test pattern viewed on a CRT in a SEM mode, from a first image position when the stage is not moving to a second position when the stage is moving with a constant speed.</p> |
