发明名称 CONTACT STRUCTURE OF SUPERCONDUCTIVE FILM AND NORMAL CONDUCTIVE FILM
摘要 PURPOSE:To alleviate current concentration in a contact section, and to increase the quantity of currents of superconductive currents flowing into the contact section by forming the contact section in size thicker than other sections in the film thickness of a normal conductive film and shaping a normal conductive film having resistivity lower than the normal conductive film to the contact section. CONSTITUTION:A contact section is formed in size thicker than other sections in the film the thickness of a Mo film 6. Consequently, the surface resistance of the Mo film 6 in the contact section can be lowered. A Nb film 8 and the Mo film 6 are brought into contact through an Au film 9 (3000Angstrom ). As a result, the Au film having lou resistivity is shaped to the contact section, thus reducing surface resistance. Accordingly, current concentration in the contact section can be alleiviated, thus increasing superconductive currents.
申请公布号 JPS6474769(A) 申请公布日期 1989.03.20
申请号 JP19870233004 申请日期 1987.09.17
申请人 FUJITSU LTD 发明人 TAMURA YASUTAKA
分类号 H01L39/00;H01L39/02;H01L39/24;H01R4/68 主分类号 H01L39/00
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