| 摘要 |
PURPOSE:To form an excellent oxide superconducting thin film with good reproductivity by depositing an extremely thin film of oxide superconducting material, and thermally processing it, and further repeating the above processes. CONSTITUTION:The vessel of vapor deposition device for forming a superconducting thin film is composed of a vapor deposition source housing member 1 and a substrate housing member 2, both of which are connected by a gate valve 3. To a hopper 6 of this housing member 1, a raw powder 5 having oxide powder mixed therein with a specified ratio is supplied to feed it a chute 7 to which oscillation generated by a vibrator 8 are given. This time, the valve 3 is opened by means of a valve control circuit 14, and valve 12, 13 are closed to set the internal pressure to a specified vacuum level. A substrate 11 is placed from a gate valve 9 on a substrate heater/supporter 10, on which substrate on oxide superconducting thin film with a specified thickness is formed. The substrate 11 is thermally processed at a predetermined tempera ture, then formation of the thin film and the thermal processing are repeated to form excellent thin films with good reproductivity. |
