| 摘要 |
PURPOSE:To enhance the efficiency of exposing by providing a reticle pattern on pellets arranged and formed on a wafer, inspecting or storing the propriety of the pellets when performing a step and repeat exposure treatment and sequentially moving only the good pellets to the exposing position, thereby not exposing the improper pellets. CONSTITUTION:An exposure apparatus is composed of an exposure unit 10, a detector 20 for detecting the proper one of pellets provided on a wafer 1, an input unit 30 which inputs the information, a memory 40 which stores the information, an exposing position setter 50 provided on part of the unit 10 for deciding the exposing sequence of the pellets on the basis of the information, and a controller 60 for controlling the setter 50 provided on part of the unit 10 to sequentially set the pellets on the exposed positions. In this structure, the unit 10 has a lamp 11, a reflecting mirror 12, and an illuminating system 15, reticles 17 placed on a holder 16 are emitted, the wafer 1 is scanned through contraction lens 18 placed under the reticles 17, thereby discriminating the propriety of the pellets. |
