发明名称 GAS LASER EQUIPMENT
摘要 PURPOSE:To generate spatially uniform plasma, and improve cooling efficiency, by arranging a first conductor wall with conductivity higher than plasma, which wall faces dielectric being a microwave incident window, and installing a refrigerant path between the dielectric and a second conductor wall, or in the dielectric. CONSTITUTION:By intense microwave electromagnetic field generating so as to concentrate in the vicinity of ridges 21, 22, laser gas such as carbon dioxide gas laser gas sealed in a discharge space 25 is subjected to discharge breakdown, plasma is generated, and laser medium is excited. In order to cool the discharge plasma, low loss liquid for microwave is made to flow in a refrigerant path 27, and cooling water is made to flow in a cooling water path. By adequately selecting the discharge condition like laser gas pressure, the laser oscillation condition is obtained. The discharge space 25 is formed between a conductor wall 23 and dielectric 24 which is arranged so as to face the conductor wall 23 and serves as an incidence window of microwave. In this discharge space 25, microwave discharge is generated, and microwave enters only from the one side surface of plasma. Thereby, enabling the discharge by a desired microwave mode.
申请公布号 JPS6469072(A) 申请公布日期 1989.03.15
申请号 JP19870225213 申请日期 1987.09.10
申请人 MITSUBISHI ELECTRIC CORP 发明人 YOSHIZAWA KENJI;NISHIMAE JUNICHI;TAKI MASAKAZU;YANAGI TADASHI;UEDA YOSHIHIRO
分类号 H01S3/09;H01S3/03;H01S3/04;H01S3/041;H01S3/0975 主分类号 H01S3/09
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