发明名称 GAS LASER EQUIPMENT
摘要 PURPOSE:To generate stable and spatially uniform plasma, increase cooling efficiency, and enable large output laser operation with high efficiency, by arranging a conductor wall with conductivity higher than plasma, which faces dielectric being a microwave incident window, and making cooling water in a cooling water channel arranged in a ridge come directly into contact with a metallized layer formed on the dielectric. CONSTITUTION:By intense microwave electromagnetic field being generated so as to concentrate in the vicinity of ridges 21, 22, laser gas sealed in a discharge space 25 is subjected to discharge breakdown, plasma is generated, and laser medium is excited. The discharge space 25 is formed between the conductor wall 23 and the dielectric 24 which is arranged so as to face the conductor wall 23 and serves as an incident window of microwave. In this discharge space 26, microwave discharge is generated, and microwave enters only from the one side surface of plasma. Thereby, enabling the discharge by a desired microwave mode. On the dielectric 24 surface opposite to the discharge space 25 side, a metallized layer 26 is formed in the state of close contact and unified in a body. This layer faces a cooling channel 29 and comes directly into contact with cooling water, so that the dielectric 24 is directly cooled.
申请公布号 JPS6469079(A) 申请公布日期 1989.03.15
申请号 JP19870225220 申请日期 1987.09.10
申请人 MITSUBISHI ELECTRIC CORP 发明人 NISHIMAE JUNICHI;YOSHIZAWA KENJI;TAKI MASAKAZU;YANAGI TADASHI;UEDA YOSHIHIRO
分类号 H01J37/32;H01S3/03;H01S3/09;H01S3/0975;H05H1/46 主分类号 H01J37/32
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