发明名称 |
Preparation of Group II metal alkyls |
摘要 |
PCT No. PCT/GB86/00197 Sec. 371 Date Jan. 27, 1987 Sec. 102(e) Date Jan. 27, 1987 PCT Filed Apr. 9, 1986 PCT Pub. No. WO86/06071 PCT Pub. Date Oct. 23, 1986.A method of preparing high purity dimethyl cadmium or dimethyl zinc suitable for use in the deposition of Group II-VI epitaxial layers, which consists of forming an adduct of the metal alkyl with a non-chelating tertiary amine containing at least two tertiary amino groups per amine molecule, and subsequently dissociating the adduct to liberate the metal alkyl as a vapor. The adducts formed during the preparative method are found to dissociate readily on heating and yet are substantially involatile and so do not contaminate the liberated metal alkyl. A preferred amine suitable for use in the preparative method is 4,4' bipyridyl.
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申请公布号 |
US4812586(A) |
申请公布日期 |
1989.03.14 |
申请号 |
US19870948348 |
申请日期 |
1987.01.27 |
申请人 |
THE SECRETARY OF STATE FOR DEFENCE IN HER BRITANNIC MAJESTY'S GOVERNMENT OF THE UNITED KINGDOM OF GREAT BRITAIN AND NORTHERN IRELAND |
发明人 |
MULLIN, JOHN B.;HAMILTON, JOHN C.;ORRELL, ELISABETH D.;JACOBS, PHILIP R.;SHENAI-KHATKHATE, DEODATTTA V. |
分类号 |
C07F3/06;C07F3/08;(IPC1-7):C07F3/06 |
主分类号 |
C07F3/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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