发明名称 METHOD FOR ADMINISTRATING ETCHING LIQUID
摘要 PURPOSE:To automatically maintain the titled liquid always constantly with good reproducibility by extracting said liquid from a treatment tank to the cell part of a spectrophotometer, measuring the absorbancy of the liquid and simultaneously executing the feed and discharge of the liquid to and from the tank. CONSTITUTION:The etching liquid (E) is fed from the treatment tank of a spray etching device 1 to the cell part 15 of the spectrophotometer 4 by a tube 2 and a roller pump 3 and light is projected from a light source 11 on the cell 15. The transparency thereof is then detected by a photodetecting part 10. This reception signal is applied to a detector 12 and is subjected to data rearrangement by CPUs 5, 13 provided on the outside and inside of the photometer 4, by which the degree of fatigue of the liquid is automatically processed and the administration point of the liquid E is elucidated. The electric signals from the CPUs are so converted by an A/D converter 6 that the discarding of the liquid E from the device 1 and the supply of the liquid E to the device 1 are properly executed by means of a motor pump. The etching capacity of the liquid E is maintained always constant, by which the conveying speed of a substrate material 9 which is a work is maintained constant.
申请公布号 JPS6468483(A) 申请公布日期 1989.03.14
申请号 JP19870224850 申请日期 1987.09.08
申请人 SEIKO INSTR & ELECTRON LTD 发明人 NAKASONE KAZUHISA
分类号 C23F1/00 主分类号 C23F1/00
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