| 摘要 |
PURPOSE:To eliminate stirring up of dust in a reaction chamber and form a reaction membrane without defects by controlling timely the variation of gas flow rate from zero to a specified flow rate. CONSTITUTION:When gas is introduced into a reaction chamber 3 through a gas flow rate control device 1 in a vacuum membrane forming device or the like, the gas flow rate control device 1 is controlled in a manner that the time variation of the flow rate from the start of gas introduction into the reaction chamber 3 up to the specified flow rate shows the specified variation properties by a control device 8. As a result, stirring up of dust in the reaching chamber is eliminated and a reaction membrane without defects can be formed. |
