发明名称 MANUFACTURE OF SUPERCONDUCTIVE THIN FILM
摘要 PURPOSE:To obtain a thin film of a superconductive material having high superconductive critical temperatures and a uniform composition and a system by conducting physical evaporation using a target of the mixture of a specific oxide and/or a composite oxide, or of a composite oxide including a specific element, and forming a thin film of a perovskite type oxide or a dummy perovskite type oxide. CONSTITUTION:The following targets are used: a target of the mixture of an oxide including at least one kind selected from a group composed of La, Ba, and Cu and/or a composite oxide, or a target of a composite oxide containing all elements included in the element group mentioned above. An atomic ratio Ba/(Ba+La) and Cu/(Ba+La) in the target are preferably in the range of 0.04-0.96 and 0.5-0.7 respectively. An evaporation atmosphere is made to have Ar and O2, and Ar partial pressure to be in the range of 2.0X10<-3>-9X10<-1>Torr. Physical evaporation can be RF sputtering, and a substrate is heated with a heater when sputtering. One kind can be selected from a group composed of glass, quartz, Si, stainless steel, and ceramics as the substrate.
申请公布号 JPS6463220(A) 申请公布日期 1989.03.09
申请号 JP19880062911 申请日期 1988.03.16
申请人 SUMITOMO ELECTRIC IND LTD 发明人 FUJITA NOBUHIKO;FUJIMORI NAOHARU;ITOZAKI HIDEO;TANAKA SABURO;HARADA KEIZO;JODAI TETSUJI
分类号 C23C14/08;C04B35/45;C23C14/06;C30B29/22;H01B12/06;H01B13/00;H01L39/24 主分类号 C23C14/08
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