| 摘要 |
<p>According to the production method of a thin-film EL device of the present invention, a step of forming a light-emitting layer comprises a step of forming a mother material layer l' as a light-emitting mother material and an ion implantation step of implanting a light-emitting center (I) into the mother material layer. Accordingly, the content of the center can be controlled with high controllability and the light emission efficiency can be improved. In the mass production process in which a variety of devices are produced, the light-emitting mother material layers are all formed by using the same target and the kind and amount of the emitting center impurities may be selected in the ion implantation process. Accordingly, the productivity is quite high. According to the production method of a color display device of the present invention, the step of forming the light-emitting layer comprises a step of forming a plurality of mother material patterns as the light-emitting mother material and an ion implantation step of ion-implanting light-emitting centers of desired colors sequentially and selectively into the mother material layer and forming a plurality of light-emitting layers having desired color patterns. Accordingly, the production is very easy and the positions and colors can be selected freely.</p> |
