| 摘要 |
<p>PURPOSE:To make the thickness of a thin film uniform by forming the thin film by spreading a soln. of polyamide acid having a specified structure contg. >=1wt.% specified org. compd. on the surface of water and bonding the thin film integrally to the surface of a base material. CONSTITUTION:A soln. of polyamide acid consisting of recurrent units expressed by formula I [wherein X is O, CO, S, SO2, CH2, C(CH3)3, C(CF3)2; R is an aromatic tetracarboxylic acid residue]. Further, >=1wt.% org. compd. having 9.0-11.0 solubility parameter is incorporated into the soln., and the soln. is spread on the surface of water to form a thin film. Then after bringing the thin film to contact with said thin film to bond the thin film integrally to the surface of the base material, the thin film is imidized. Examples for the org. compd. having 9.0-11.0 solubility parameter are aliphatic, cycloaliphatic, or aromatic ketones, esters, ethers, or amines, etc.</p> |
