| 摘要 |
PURPOSE:To obtain high-quality printing without printing density deterioration and difference in printing color tone caused by a shortage of current capacity by chamfering the end of a common electrode on an insulative substrate or a substrate and forming a part of the common electrode on the chamfered part with an adequate width allocate to the common electrode of a thermal head. CONSTITUTION:The end of a common electrode-forming side on an alumina substrate 1 is chamfered in such a manner that, for instance, the length of the chamfered part is 0.9mm at an angle of 30 deg. with a horizontal surface. Next, a heat generating layer and an electrode layer are sputtered, and discrete electrodes 4, a common electrode 5 and the heat generating layer 3 are formed by photolithography. After this, a protec tive layer 6 is formed by sputtering all over the surface. The chamfering angle is 30 deg. from the horizontal surface and the length of a chamfered part is 0.9mm. However, an optical value can be selected within a range of 0-90 deg.. As a result, it is easy to manufacture the thermal head of the above structure and is less costly as compared to the head with a two-layer structured common electrode. In addition, when the head is mounted in an inclined position for increasing the application pressure of a thermal element part, the chamfered end of the alumina substrate 1 does not become an obstacle, which allows the inclined angle to be increased. |
