发明名称 DISTRIBUTED-FEEDBACK TYPE SEMICONDUCTOR LASER AND MANUFACTURE THEREOF
摘要 PURPOSE:To improve a laser device, wherein an outer waveguide is coupled at edge faces of an active waveguide without gaps, by extending the edge faces of a protective layer, and extending the edge faces from the edge faces of the outer waveguide layer on both sides. CONSTITUTION:On a P-type InP substrate 1, a P-type InP buffer layer 2, an InGaAsP active waveguide 3 and an N-type InP protective layer 4 are sequentially grown. A stripe shaped SiN film 5 is formed on the N-type InP protective layer 4. Then etching is performed. A diffraction grating, which is to become a distribution Bragg reflector 6, is formed on the exposed P-type InP buffer layer 2. The InP protective layer 4 is used as a mask, and the InGaAs active waveguide layer 3 is etched from the edge faces toward inside. An N-type InGaAsP outer waveguide layer 7 is grown thereon. The InGaAsP is well turned into a space having an overhang structure. A crystal is continuously grown from the edge faces W of the InGaAsP active waveguide layer 3.
申请公布号 JPS6461081(A) 申请公布日期 1989.03.08
申请号 JP19870218461 申请日期 1987.09.01
申请人 RES DEV CORP OF JAPAN;SUMITOMO ELECTRIC IND LTD;TOKYO INST OF TECHNOL 发明人 NISHIZAWA HIDEAKI;TAKAHASHI MITSUO;SUEMATSU YASUHARU
分类号 H01L21/306;H01S5/00;H01S5/026;H01S5/125 主分类号 H01L21/306
代理机构 代理人
主权项
地址