发明名称 |
PROCESS FOR THE OBTENTION OF A PATTERN, ESPECIALLY FROM A FERROMAGNETIC MATERIAL HAVING FLANKS WITH DIFFERENT STEEPNESSES, AND MAGNETIC HEAD WITH SUCH A PATTERN |
摘要 |
This process consists in depositing a photosensitive resin layer (6) on a ferromagnetic layer (4) resting on a ceramic base (2); in photolithoetching an opening (8) in this resin layer and in then polymerising this resin so that the flanks (8a) of the said opening are sloped; forming a two-layer mask (10a, 12a) on the resin layer partly masking the said opening and defining the shape of the pattern to be produced in the ferromagnetic layer; anisotropically etching the resin layer so as to remove the unmasked regions of this layer; removing the mask; anisotropically etching the ferromagnetic layer (4) whilst using the etched resin layer as etching mask (6a), and removing the remainder of the resin layer. …<IMAGE>… |
申请公布号 |
EP0304373(A3) |
申请公布日期 |
1989.03.08 |
申请号 |
EP19880402075 |
申请日期 |
1988.08.10 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE ETABLISSEMENT DE CARACTERE SCIENTIFIQUE TECHNIQUE ET INDUSTRIEL |
发明人 |
SIBUET, HENRI |
分类号 |
G03F7/00;G03F7/26;G11B5/31;H01F41/34;(IPC1-7):H01F41/14 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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