发明名称 Laser exposure apparatus
摘要 A laser exposure system for use in scanning and recording images, the system comprising subdividing the laser beam from the laser source into several parallel traces of laser beams; modulating the laser beams individually in response to the image signals by means of a multi-channel optical modulator; directing the modulated laser beams through a first mirror and a second mirror so as to enable the laser beams from the second mirror to be in parallel with the reference plane with respect to the sub-scanning direction; varying the distance between the modulator and the first mirror; and adjusting the angles of the first and second mirrors to the reference plane so that a possible decline of the laser beams in the subscanning direction is compensated.
申请公布号 US4810068(A) 申请公布日期 1989.03.07
申请号 US19870033582 申请日期 1987.04.01
申请人 DAINIPPON SCREEN MANUFACTURING CO., LTD. 发明人 SHIMAZU, SHIGEAKI;ENDO, KENJI;TAMAKI, EIICHI;WADA, YASUYUKI;OKAZAKI, MASAHIDE;KAGEYAMA, TAKESHI;KURATA, YOSHIO
分类号 H04N1/06;H04N1/191;(IPC1-7):G02F1/11;G02F1/03;G11B7/00 主分类号 H04N1/06
代理机构 代理人
主权项
地址